Talk at apc|m 2019

I recently attended the 19th European Advanced Process Control and Manufacturing Conference, held this year in the nice city of Villach, Austria. The conference hosts experts in semiconductor manufacturing from both academia and industry.

I had the pleasure to talk about our work on an information-theoretic similarity measure for patterns on analog wafermaps. Analog wafermaps depict electrical measurement values of devices on a wafer, and patterns on these wafermaps may indicate process deviations. Detection and classifying these patterns, and reacting appropriately, can prevent further such deviations and, consequently, yield loss. Our work, a collaboration between Know-Center and K-AI within the SemI40 project, makes use of a feature extraction pipeline that was recently accepted for publication in the IEEE Transactions on Semiconductor Manufacturing. If you are interested in the slides, just click on the image below.